Abstract

DOMINGUEZ, M.A. et al. Impact of planarized gate electrode in bottom-gate thin-film transistors. Rev. mex. fis. [online]. 2016, vol.62, n.3, pp.223-228. ISSN 0035-001X.

In this work, the fabrication of bottom-gate TFTs with unplanarized and planarized gate electrode are reported, as well simulations of the impact of the gate planarization in the TFTs are presented. Previously in literature, a reduction of the contact resistance has been attributed to this planarized structure. In order to provide a physical explanation of this improvement, the electrical performance of ambipolar a-SiGe:H TFTs with planarized gate electrode by Spin-On Glass is compared with unplanarized ambipolar a-SiGe:H TFTs. Then, the properties in the main device interfaces are analyzed by physically-based simulations. The planarized TFTs have better characteristics such as field-effect mobility, on-current, threshold voltage and on/off-current ratio which are consequence of the improved contact resistance.

Keywords : Thin-film transistor; hydrogenated amorphous silicon-germanium; simulation; planarization.

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