<?xml version="1.0" encoding="ISO-8859-1"?><article xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance">
<front>
<journal-meta>
<journal-id>0035-001X</journal-id>
<journal-title><![CDATA[Revista mexicana de física]]></journal-title>
<abbrev-journal-title><![CDATA[Rev. mex. fis.]]></abbrev-journal-title>
<issn>0035-001X</issn>
<publisher>
<publisher-name><![CDATA[Sociedad Mexicana de Física]]></publisher-name>
</publisher>
</journal-meta>
<article-meta>
<article-id>S0035-001X2007000900016</article-id>
<title-group>
<article-title xml:lang="en"><![CDATA[Ion beam analysis of CH/Si layers deposited by ECR-CVD]]></article-title>
</title-group>
<contrib-group>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Mejía Hernández]]></surname>
<given-names><![CDATA[J.A]]></given-names>
</name>
<xref ref-type="aff" rid="A04"/>
</contrib>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Murillo]]></surname>
<given-names><![CDATA[G]]></given-names>
</name>
<xref ref-type="aff" rid="A01"/>
</contrib>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Policroniades]]></surname>
<given-names><![CDATA[R]]></given-names>
</name>
<xref ref-type="aff" rid="A01"/>
</contrib>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Andrade]]></surname>
<given-names><![CDATA[E]]></given-names>
</name>
<xref ref-type="aff" rid="A02"/>
</contrib>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Camps]]></surname>
<given-names><![CDATA[E]]></given-names>
</name>
<xref ref-type="aff" rid="A04"/>
</contrib>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Muhl]]></surname>
<given-names><![CDATA[S]]></given-names>
</name>
<xref ref-type="aff" rid="A03"/>
</contrib>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Zavala]]></surname>
<given-names><![CDATA[E.P.]]></given-names>
</name>
<xref ref-type="aff" rid="A02"/>
</contrib>
</contrib-group>
<aff id="A01">
<institution><![CDATA[,ININ Depto. del Acelerador ]]></institution>
<addr-line><![CDATA[México D.F.]]></addr-line>
</aff>
<aff id="A02">
<institution><![CDATA[,Universidad Nacional Autónoma de México Instituto de Física ]]></institution>
<addr-line><![CDATA[México D.F.]]></addr-line>
</aff>
<aff id="A03">
<institution><![CDATA[,Universidad Nacional Autónoma de México Instituto de Investigaciones de Materiales ]]></institution>
<addr-line><![CDATA[México D.F.]]></addr-line>
</aff>
<aff id="A04">
<institution><![CDATA[,ININ Departamento de Física ]]></institution>
<addr-line><![CDATA[México D.F.]]></addr-line>
</aff>
<pub-date pub-type="pub">
<day>00</day>
<month>02</month>
<year>2007</year>
</pub-date>
<pub-date pub-type="epub">
<day>00</day>
<month>02</month>
<year>2007</year>
</pub-date>
<volume>53</volume>
<fpage>65</fpage>
<lpage>67</lpage>
<copyright-statement/>
<copyright-year/>
<self-uri xlink:href="http://www.scielo.org.mx/scielo.php?script=sci_arttext&amp;pid=S0035-001X2007000900016&amp;lng=en&amp;nrm=iso"></self-uri><self-uri xlink:href="http://www.scielo.org.mx/scielo.php?script=sci_abstract&amp;pid=S0035-001X2007000900016&amp;lng=en&amp;nrm=iso"></self-uri><self-uri xlink:href="http://www.scielo.org.mx/scielo.php?script=sci_pdf&amp;pid=S0035-001X2007000900016&amp;lng=en&amp;nrm=iso"></self-uri><abstract abstract-type="short" xml:lang="en"><p><![CDATA[We present in this study the characteristics of CH layers deposited on Si substrates using an electron cyclotron resonance (ECR) microwave plasma source with different H2/CH4 mixtures. Quantification of the hydrogen and carbon content and the thickness of the films was determined by Forward Elastic Scattering with a 8.45 MeV 12C3+ beam. The oxygen concentration in the films was measure by Nuclear Reaction Analysis (NRA) using a 1.040 MeV deuterium.]]></p></abstract>
<abstract abstract-type="short" xml:lang="es"><p><![CDATA[En este trabajo se estudia las características de las capas de CH depositadas en sustratos de Si por una fuente de plasma de micro ondas del tipo Resonancia Ciclotrónica Electrónica (ECR), usándose diferentes mezclas de H2/CH4. El contenido de hidrógeno y carbono, así como el espesor de las películas se determinó por la dispersión hacia delante de un haz de 12C3+ con una energía de 8.45 MeV, y el bajo contenido de oxígeno en las mismas se determinó usando un haz de deuterio de 1.040 MeV llevando a cabo un análisis de reacciones nucleares (NRA).]]></p></abstract>
<kwd-group>
<kwd lng="en"><![CDATA[Plasma enhanced chemical vapor deposition]]></kwd>
<kwd lng="en"><![CDATA[thin films]]></kwd>
<kwd lng="en"><![CDATA[IBA methods]]></kwd>
<kwd lng="es"><![CDATA[Películas delgadas]]></kwd>
<kwd lng="es"><![CDATA[métodos de análisis con haz de acelerador]]></kwd>
</kwd-group>
</article-meta>
</front><body><![CDATA[ <p align="center"><font face="verdana" size="4"><b>Ion beam analysis of CH/Si layers deposited by ECR-CVD</b></font></p>     <p align="center"><font face="verdana" size="2">&nbsp;</font></p>     <p align="center"><font face="verdana" size="2"><b>J.A. Mej&iacute;a Hern&aacute;ndez<sup>c,d</sup>, G. Murillo&ordf;<sup> ,</sup>*, R. Policroniades&ordf;, E. Andrade<sup>b</sup>, E. Camps<sup>d</sup>, S. Muhl<sup>c</sup>, and E.P. Zavala<sup>b</sup></b></font></p>     <p align="center"><font face="verdana" size="2">&nbsp;</font></p>     <p align="justify"><font face="verdana" size="2">&ordf; <i>Acelerador Tandem, ININ, Depto. del Acelerador, Apartado Postal 18-1027, 11801 M&eacute;xico D.F. </i></font></p>     <p align="justify"><font face="verdana" size="2"><i><sup>b </sup>Instituto de F&iacute;sica, Universidad Nacional Aut&oacute;noma de M&eacute;xico, Apartado Postal 20-364, 01000 M&eacute;xico D.F.</i></font></p>     <p align="justify"><font face="verdana" size="2"><i><sup>c </sup>Instituto de Investigaciones de Materiales, Universidad Nacional Aut&oacute;noma de M&eacute;xico, Apartado Postal 70-360, 04510 M&eacute;xico, D.F.</i></font></p>     <p align="justify"><font face="verdana" size="2"><i><sup>d </sup>Departamento de F&iacute;sica, ININ, Apartado Postal 20-364, 01000 M&eacute;xico D.F.</i></font></p>     <p align="justify"><font face="verdana" size="2">&nbsp;</font></p>     <p align="justify"><font size="2" face="verdana"><b>Correspondencia:</b>    ]]></body>
<body><![CDATA[<br> * Tel. +52 55 5329-7200, ext. 2335, <b>    <br> </b>e-mail: <a href="mailto:gmo@nuclear.inin.mx">gmo@nuclear.inin.mx</a></font></p>     <p align="justify"></p><font face="verdana" size="2">&nbsp;</font></p>     <p align="justify"><font size="2" face="verdana">Recibido el 2 de marzo de 2006    <br>   Aceptado el 18 de agosto de 2006</font></p>     <p align="justify"><font face="verdana" size="2">&nbsp;</font></p>     <p align="justify"><font face="verdana" size="2"><b>Abstract</b></font></p>     <p align="justify"><font face="verdana" size="2">We present in this study the characteristics of CH layers deposited on Si substrates using an electron cyclotron resonance (ECR) microwave plasma source with different H<sub>2</sub>/CH<sub>4</sub> mixtures. Quantification of the hydrogen and carbon content and the thickness of the films was determined by Forward Elastic Scattering with a 8.45 MeV <sup>12</sup>C<sup>3</sup><sup>+</sup> beam. The oxygen concentration in the films was measure by Nuclear Reaction Analysis (NRA) using a 1.040 MeV deuterium.</font></p>     <p align="justify"><font face="verdana" size="2"><b>Keywords:</b> Plasma enhanced chemical vapor deposition; thin films; IBA methods.</font></p>     <p align="justify"><font face="verdana" size="2">&nbsp;</font></p>     ]]></body>
<body><![CDATA[<p align="justify"><font face="verdana" size="2"><b>Resumen</b></font></p>     <p align="justify"><font face="verdana" size="2">En este trabajo se estudia las caracter&iacute;sticas de las capas de CH depositadas en sustratos de Si por una fuente de plasma de micro ondas del tipo Resonancia Ciclotr&oacute;nica Electr&oacute;nica (ECR), us&aacute;ndose diferentes mezclas de H2/CH4. El contenido de hidr&oacute;geno y carbono, as&iacute; como el espesor de las pel&iacute;culas se determin&oacute; por la dispersi&oacute;n hacia delante de un haz de 12C3+ con una energ&iacute;a de 8.45 MeV, y el bajo contenido de ox&iacute;geno en las mismas se determin&oacute; usando un haz de deuterio de 1.040 MeV llevando a cabo un an&aacute;lisis de reacciones nucleares (NRA).</font></p>     <p align="justify"><font face="verdana" size="2"><b>Descriptores: </b>Pel&iacute;culas delgadas; m&eacute;todos de an&aacute;lisis con haz de acelerador.</font></p>     <p align="justify"><font face="verdana" size="2">&nbsp;</font></p>     <p align="justify"><font face="verdana" size="2">PACS: 52.Hr; 82.80.Yc; 73.61.r</font></p>     <p align="justify"><font face="verdana" size="2">&nbsp;</font></p>     <p align="justify"><font face="verdana" size="2"><a href="/pdf/rmf/v53s3/v53s3a16.pdf">DESCARGAR ART&Iacute;CULO EN FORMATO PDF</a> </font></p>     <p align="justify"><font face="verdana" size="2">&nbsp;</font></p>     <p align="justify"><font face="verdana" size="2"><b>Acknowledgements</b></font></p>     <p align="justify"><font face="verdana" size="2">The authors wish to thank P. Villase&ntilde;or for the operation of the Tandem Accelerator. This work was partially supported by DGAPA_UNAM under the project 228603-3.</font></p>     ]]></body>
<body><![CDATA[<p align="justify"><font face="verdana" size="2">&nbsp;</font></p>     <p align="justify"><font face="verdana" size="2"><b>References</b></font></p>     <!-- ref --><p align="justify"><font face="verdana" size="2">1. S. Aisenberg and R. Chabot, <i>J. Appl. Phys. </i><b>42</b> (1971) 2953.</font>&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;[&#160;<a href="javascript:void(0);" onclick="javascript: window.open('/scielo.php?script=sci_nlinks&ref=8392058&pid=S0035-001X200700090001600001&lng=','','width=640,height=500,resizable=yes,scrollbars=1,menubar=yes,');">Links</a>&#160;]<!-- end-ref --><!-- ref --><p align="justify"><font face="verdana" size="2">2. J. Robertson, <i>Materials Science and Engineering R </i><b>37</b> (2002) 129.</font>&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;[&#160;<a href="javascript:void(0);" onclick="javascript: window.open('/scielo.php?script=sci_nlinks&ref=8392059&pid=S0035-001X200700090001600002&lng=','','width=640,height=500,resizable=yes,scrollbars=1,menubar=yes,');">Links</a>&#160;]<!-- end-ref --><!-- ref --><p align="justify"><font face="verdana" size="2">3. S. Romero, M. Fern&aacute;ndez, G. Murillo, and H.M. Berdejo, <i>Nucl. Instr. and Meth. B </i><b>194 </b>(2001) 164.</font>&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;[&#160;<a href="javascript:void(0);" onclick="javascript: window.open('/scielo.php?script=sci_nlinks&ref=8392060&pid=S0035-001X200700090001600003&lng=','','width=640,height=500,resizable=yes,scrollbars=1,menubar=yes,');">Links</a>&#160;]<!-- end-ref --><!-- ref --><p align="justify"><font face="verdana" size="2">4. E. Camps <i>et. al., Rev. Sci. Instrum. </i><b>66</b> (1995) 3219.</font>&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;[&#160;<a href="javascript:void(0);" onclick="javascript: window.open('/scielo.php?script=sci_nlinks&ref=8392061&pid=S0035-001X200700090001600004&lng=','','width=640,height=500,resizable=yes,scrollbars=1,menubar=yes,');">Links</a>&#160;]<!-- end-ref --><!-- ref --><p align="justify"><font face="verdana" size="2">5. M. Mayer, SIMNRA Users Guide, Report IPP 9/113, Max-Planck-Institut fur Plasmaphysik, Garching, 1997.</font>&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;[&#160;<a href="javascript:void(0);" onclick="javascript: window.open('/scielo.php?script=sci_nlinks&ref=8392062&pid=S0035-001X200700090001600005&lng=','','width=640,height=500,resizable=yes,scrollbars=1,menubar=yes,');">Links</a>&#160;]<!-- end-ref --> ]]></body><back>
<ref-list>
<ref id="B1">
<label>1</label><nlm-citation citation-type="journal">
<person-group person-group-type="author">
<name>
<surname><![CDATA[Aisenberg]]></surname>
<given-names><![CDATA[S]]></given-names>
</name>
<name>
<surname><![CDATA[Chabot]]></surname>
<given-names><![CDATA[R]]></given-names>
</name>
</person-group>
<source><![CDATA[J. Appl. Phys]]></source>
<year>1971</year>
<numero>42</numero>
<issue>42</issue>
<page-range>2953</page-range></nlm-citation>
</ref>
<ref id="B2">
<label>2</label><nlm-citation citation-type="journal">
<person-group person-group-type="author">
<name>
<surname><![CDATA[Robertson]]></surname>
<given-names><![CDATA[J]]></given-names>
</name>
</person-group>
<source><![CDATA[Materials Science and Engineering R]]></source>
<year>2002</year>
<numero>37</numero>
<issue>37</issue>
<page-range>129</page-range></nlm-citation>
</ref>
<ref id="B3">
<label>3</label><nlm-citation citation-type="journal">
<person-group person-group-type="author">
<name>
<surname><![CDATA[Romero]]></surname>
<given-names><![CDATA[S]]></given-names>
</name>
<name>
<surname><![CDATA[Fernández]]></surname>
<given-names><![CDATA[M]]></given-names>
</name>
<name>
<surname><![CDATA[Murillo]]></surname>
<given-names><![CDATA[G]]></given-names>
</name>
<name>
<surname><![CDATA[Berdejo]]></surname>
<given-names><![CDATA[H.M]]></given-names>
</name>
</person-group>
<source><![CDATA[Nucl. Instr. and Meth. B]]></source>
<year>2001</year>
<numero>194</numero>
<issue>194</issue>
<page-range>164</page-range></nlm-citation>
</ref>
<ref id="B4">
<label>4</label><nlm-citation citation-type="journal">
<person-group person-group-type="author">
<name>
<surname><![CDATA[Camps]]></surname>
<given-names><![CDATA[E]]></given-names>
</name>
</person-group>
<source><![CDATA[Rev. Sci. Instrum]]></source>
<year>1995</year>
<numero>66</numero>
<issue>66</issue>
<page-range>3219</page-range></nlm-citation>
</ref>
<ref id="B5">
<label>5</label><nlm-citation citation-type="book">
<person-group person-group-type="author">
<name>
<surname><![CDATA[Mayer]]></surname>
<given-names><![CDATA[M]]></given-names>
</name>
</person-group>
<source><![CDATA[SIMNRA Users Guide, Report IPP 9/113]]></source>
<year>1997</year>
<publisher-loc><![CDATA[Garching ]]></publisher-loc>
<publisher-name><![CDATA[Max-Planck-Institut fur Plasmaphysik]]></publisher-name>
</nlm-citation>
</ref>
</ref-list>
</back>
</article>
