<?xml version="1.0" encoding="ISO-8859-1"?><article xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance">
<front>
<journal-meta>
<journal-id>1665-6423</journal-id>
<journal-title><![CDATA[Journal of applied research and technology]]></journal-title>
<abbrev-journal-title><![CDATA[J. appl. res. technol]]></abbrev-journal-title>
<issn>1665-6423</issn>
<publisher>
<publisher-name><![CDATA[Universidad Nacional Autónoma de México, Instituto de Ciencias Aplicadas y Tecnología]]></publisher-name>
</publisher>
</journal-meta>
<article-meta>
<article-id>S1665-64232017000600593</article-id>
<article-id pub-id-type="doi">10.1016/j.jart.2017.07.003</article-id>
<title-group>
<article-title xml:lang="en"><![CDATA[Sequential microcontroller-based control for a chemical vapor deposition process]]></article-title>
</title-group>
<contrib-group>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Serrano Pérez]]></surname>
<given-names><![CDATA[Edgar]]></given-names>
</name>
<xref ref-type="aff" rid="Aff"/>
</contrib>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Serrano Pérez]]></surname>
<given-names><![CDATA[Javier]]></given-names>
</name>
<xref ref-type="aff" rid="Aff"/>
</contrib>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Martínez Piñón]]></surname>
<given-names><![CDATA[Fernando]]></given-names>
</name>
<xref ref-type="aff" rid="Aff"/>
</contrib>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Juárez García]]></surname>
<given-names><![CDATA[José Manuel]]></given-names>
</name>
<xref ref-type="aff" rid="Aff"/>
</contrib>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Serrano Pérez]]></surname>
<given-names><![CDATA[Omar]]></given-names>
</name>
<xref ref-type="aff" rid="Aff"/>
</contrib>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Juárez López]]></surname>
<given-names><![CDATA[Fernando]]></given-names>
</name>
<xref ref-type="aff" rid="Aff"/>
</contrib>
</contrib-group>
<aff id="Af1">
<institution><![CDATA[,Instituto Politécnico Nacional  ]]></institution>
<addr-line><![CDATA[D.F. ]]></addr-line>
<country>Mexico</country>
</aff>
<aff id="Af2">
<institution><![CDATA[,Universidad Tecnológica de Tecámac  ]]></institution>
<addr-line><![CDATA[Tecámac Estado de Mexico]]></addr-line>
<country>Mexico</country>
</aff>
<aff id="Af3">
<institution><![CDATA[,Centro Nacional de Metrología  ]]></institution>
<addr-line><![CDATA[ Querétaro]]></addr-line>
<country>Mexico</country>
</aff>
<aff id="Af4">
<institution><![CDATA[,Instituto Politécnico Nacional Departamento de Posgrado ]]></institution>
<addr-line><![CDATA[Ciudad de México ]]></addr-line>
<country>Mexico</country>
</aff>
<pub-date pub-type="pub">
<day>00</day>
<month>00</month>
<year>2017</year>
</pub-date>
<pub-date pub-type="epub">
<day>00</day>
<month>00</month>
<year>2017</year>
</pub-date>
<volume>15</volume>
<numero>6</numero>
<fpage>593</fpage>
<lpage>598</lpage>
<copyright-statement/>
<copyright-year/>
<self-uri xlink:href="http://www.scielo.org.mx/scielo.php?script=sci_arttext&amp;pid=S1665-64232017000600593&amp;lng=en&amp;nrm=iso"></self-uri><self-uri xlink:href="http://www.scielo.org.mx/scielo.php?script=sci_abstract&amp;pid=S1665-64232017000600593&amp;lng=en&amp;nrm=iso"></self-uri><self-uri xlink:href="http://www.scielo.org.mx/scielo.php?script=sci_pdf&amp;pid=S1665-64232017000600593&amp;lng=en&amp;nrm=iso"></self-uri><abstract abstract-type="short" xml:lang="en"><p><![CDATA[Abstract A cost-effective direct liquid injection system is developed for a chemical vapor deposition process using a microcontroller. The precursor gas phase is controlled by the precise sequential injection of a liquid precursor solution to a vaporizing chamber prior deposition. The electronic control system allows the human-machine interface through a LCD display and a keypad matrix. The core of the electronic system is based on an electro mechanical injector operated in time and frequency as a sequential control system by a popular PIC16F877A chip. The software has been developed in the BASIC language and it can be easily modified through an ICSP programmer for different sequential automatized routines. The injection calibration test has proven the linearity of the injection control system for different operation parameters. The results reported the sequential injection MOCVD deposition of alumina thin film.]]></p></abstract>
<kwd-group>
<kwd lng="en"><![CDATA[Microcontroller]]></kwd>
<kwd lng="en"><![CDATA[Chemical vapor deposition]]></kwd>
<kwd lng="en"><![CDATA[Direct liquid injection]]></kwd>
<kwd lng="en"><![CDATA[Thin films]]></kwd>
</kwd-group>
</article-meta>
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