<?xml version="1.0" encoding="ISO-8859-1"?><article xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance">
<front>
<journal-meta>
<journal-id>1665-6423</journal-id>
<journal-title><![CDATA[Journal of applied research and technology]]></journal-title>
<abbrev-journal-title><![CDATA[J. appl. res. technol]]></abbrev-journal-title>
<issn>1665-6423</issn>
<publisher>
<publisher-name><![CDATA[Universidad Nacional Autónoma de México, Instituto de Ciencias Aplicadas y Tecnología]]></publisher-name>
</publisher>
</journal-meta>
<article-meta>
<article-id>S1665-64232012000400005</article-id>
<title-group>
<article-title xml:lang="en"><![CDATA[A Simple Substrate Heater Device With Temperature Controller for Thin Film Preparation]]></article-title>
</title-group>
<contrib-group>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Rendón]]></surname>
<given-names><![CDATA[G.]]></given-names>
</name>
<xref ref-type="aff" rid="A01"/>
</contrib>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Poot]]></surname>
<given-names><![CDATA[P.]]></given-names>
</name>
<xref ref-type="aff" rid="A01"/>
</contrib>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Oliva]]></surname>
<given-names><![CDATA[A. l.]]></given-names>
</name>
<xref ref-type="aff" rid="A02"/>
</contrib>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Espinosa-Faller]]></surname>
<given-names><![CDATA[F. J.]]></given-names>
</name>
<xref ref-type="aff" rid="A01"/>
</contrib>
</contrib-group>
<aff id="A01">
<institution><![CDATA[,Universidad Marista de Mérida Escuela de Ingeniería ]]></institution>
<addr-line><![CDATA[Mérida Yucatán]]></addr-line>
<country>México</country>
</aff>
<aff id="A02">
<institution><![CDATA[,Instituto Politécnico Nacional Centro de Investigación y de Estudios Avanzados ]]></institution>
<addr-line><![CDATA[Mérida Yucatán]]></addr-line>
<country>México</country>
</aff>
<pub-date pub-type="pub">
<day>00</day>
<month>08</month>
<year>2012</year>
</pub-date>
<pub-date pub-type="epub">
<day>00</day>
<month>08</month>
<year>2012</year>
</pub-date>
<volume>10</volume>
<numero>4</numero>
<fpage>549</fpage>
<lpage>556</lpage>
<copyright-statement/>
<copyright-year/>
<self-uri xlink:href="http://www.scielo.org.mx/scielo.php?script=sci_arttext&amp;pid=S1665-64232012000400005&amp;lng=en&amp;nrm=iso"></self-uri><self-uri xlink:href="http://www.scielo.org.mx/scielo.php?script=sci_abstract&amp;pid=S1665-64232012000400005&amp;lng=en&amp;nrm=iso"></self-uri><self-uri xlink:href="http://www.scielo.org.mx/scielo.php?script=sci_pdf&amp;pid=S1665-64232012000400005&amp;lng=en&amp;nrm=iso"></self-uri><abstract abstract-type="short" xml:lang="en"><p><![CDATA[A simple substrate heater and its temperature controller were designed and built in order to prepare thin films in a high vacuum deposition system. The substrate heater was elaborated with a glass-ceramic body and a molybdenum foil heater. The applied power and the temperature are regulated by a power controller board using a microcontroller programmed with a proportional-integrative-derivative algorithm. The heater/controller system was tested in a high vacuum deposition system and the results of its characterization at 100, 200, 300 and 400 °C are presented. A variation in temperature better than ± 0.5 °C was obtained for all the tested temperatures. An application of the substrate heater is demonstrated by evaporating gold thin films on heated glass substrates.]]></p></abstract>
<abstract abstract-type="short" xml:lang="es"><p><![CDATA[Se presenta el diseño y la fabricación de un calentador de sustratos con control de temperatura para preparar películas delgadas en un sistema de depósito de alto vacío. El calentador de sustratos fue elaborado usando vitrocerámica y una lámina de molibdeno como elemento calefactor. La energía aplicada y la temperatura del calentador de sustrato son controladas a través de una tarjeta controladora de potencia usando un microcontrolador programado con un algoritmo basado en un sistema de control proporcional-integral-derivativo. El sistema calentador/controlador propuesto fue evaluado a las temperaturas de 100, 200, 300 y 400 °C. El sistema proporciona una regulación de temperatura menor a ±0.5 °C para todas las temperaturas evaluadas. La aplicabilidad del calentador de sustratos se demostró depositando películas delgadas de oro sobre sustratos de vidrio calentados.]]></p></abstract>
<kwd-group>
<kwd lng="en"><![CDATA[substrate heater]]></kwd>
<kwd lng="en"><![CDATA[temperature controller]]></kwd>
<kwd lng="en"><![CDATA[vacuum thin film deposition]]></kwd>
</kwd-group>
</article-meta>
</front><body><![CDATA[ <p align="center"><font face="verdana" size="4"><b>A Simple Substrate Heater Device With Temperature Controller for Thin Film Preparation</b></font></p>              <p align="center"><font face="verdana" size="2">&nbsp;</font></p>            <p align="center"><font face="verdana" size="2"><b>G. Rend&oacute;n<sup>1</sup>, P. Poot<sup>2</sup>, A. l. Oliva<sup>3</sup>, F. J. Espinosa&#45;Faller*<sup>4</sup></b></font></p>            <p align="justify"><font face="verdana" size="2">&nbsp;</font></p>            <p align="justify"><font face="verdana" size="2"><i><sup>1,2,4</sup> Universidad Marista de M&eacute;rida, Escuela de Ingenier&iacute;a, Perif&eacute;rico Norte Tablaje 13941, M&eacute;rida, Yucat&aacute;n, 97300, M&eacute;xico.</i> *<a href="mailto:fjespinosa@marista.edu.mx">fjespinosa@marista.edu.mx</a>.</font></p>            <p align="justify"><font face="verdana" size="2"><i><sup>3</sup> Centro de Investigaci&oacute;n y de Estudios Avanzados del IPN, Unidad M&eacute;rida, Departamento de F&iacute;sica Aplicada, Km. 6 Antigua Carretera a Progreso, A.P. 73&#45;Cordemex, 97310, M&eacute;rida, Yucat&aacute;n M&eacute;xico.</i></font></p>              <p align="justify"><font face="verdana" size="2">&nbsp;</font></p>            <p align="justify"><font face="verdana" size="2"><b>ABSTRACT</b></font></p>            <p align="justify"><font face="verdana" size="2">A simple substrate heater and its temperature controller were designed and built in order to prepare thin films in a high vacuum deposition system. The substrate heater was elaborated with a glass&#45;ceramic body and a molybdenum foil heater. The applied power and the temperature are regulated by a power controller board using a microcontroller programmed with a proportional&#45;integrative&#45;derivative algorithm. The heater/controller system was tested in a high vacuum deposition system and the results of its characterization at 100, 200, 300 and 400 &deg;C are presented. A variation in temperature better than &plusmn; 0.5 &deg;C was obtained for all the tested temperatures. An application of the substrate heater is demonstrated by evaporating gold thin films on heated glass substrates.</font></p>              <p align="justify"><font face="verdana" size="2"><b>Keywords:</b> substrate heater, temperature controller, vacuum thin film deposition.</font></p>              ]]></body>
<body><![CDATA[<p align="justify"><font face="verdana" size="2">&nbsp;</font></p>             <p align="justify"><font face="verdana" size="2"><b>RESUMEN</b></font></p>             <p align="justify"><font face="verdana" size="2">Se presenta el dise&ntilde;o y la fabricaci&oacute;n de un calentador de sustratos con control de temperatura para preparar pel&iacute;culas delgadas en un sistema de dep&oacute;sito de alto vac&iacute;o. El calentador de sustratos fue elaborado usando vitrocer&aacute;mica y una l&aacute;mina de molibdeno como elemento calefactor. La energ&iacute;a aplicada y la temperatura del calentador de sustrato son controladas a trav&eacute;s de una tarjeta controladora de potencia usando un microcontrolador programado con un algoritmo basado en un sistema de control proporcional&#45;integral&#45;derivativo. El sistema calentador/controlador propuesto fue evaluado a las temperaturas de 100, 200, 300 y 400 &deg;C. El sistema proporciona una regulaci&oacute;n de temperatura menor a &plusmn;0.5 &deg;C para todas las temperaturas evaluadas. La aplicabilidad del calentador de sustratos se demostr&oacute; depositando pel&iacute;culas delgadas de oro sobre sustratos de vidrio calentados.</font></p>              <p align="justify"><font face="verdana" size="2">&nbsp;</font></p>             <p align="justify"><font face="verdana" size="2"><a href="/pdf/jart/v10n4/v10n4a5.pdf" target="_blank">DESCARGAR ART&Iacute;CULO EN FORMATO PDF</a></font></p>             <p align="justify"><font face="verdana" size="2">&nbsp;</font></p>             <p align="justify"><font face="verdana" size="2"><b><i>References</i></b></font></p>              <!-- ref --><p align="justify"><font face="verdana" size="2">&#91;1&#93; Sree Harsha K. S. Principles of physical vapor deposition of thin films. Elsevier, 2006.    &nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;[&#160;<a href="javascript:void(0);" onclick="javascript: window.open('/scielo.php?script=sci_nlinks&ref=4903977&pid=S1665-6423201200040000500001&lng=','','width=640,height=500,resizable=yes,scrollbars=1,menubar=yes,');">Links</a>&#160;]<!-- end-ref --></font></p>              <!-- ref --><p align="justify"><font face="verdana" size="2">&#91;2&#93; Kohl W. H., Handbook of materials and techniques for vacuum devices, AIP Press, 1995.    &nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;[&#160;<a href="javascript:void(0);" onclick="javascript: window.open('/scielo.php?script=sci_nlinks&ref=4903979&pid=S1665-6423201200040000500002&lng=','','width=640,height=500,resizable=yes,scrollbars=1,menubar=yes,');">Links</a>&#160;]<!-- end-ref --></font></p>              <!-- ref --><p align="justify"><font face="verdana" size="2">&#91;3&#93; Clark J. C., Maria J. P., Hubbard K. J., and Schlom D. G. An oxygen&#45;compatible radiant substrate heater for thin film growth at substrate temperatures up to 1050&deg;C, Rev. Sci. Instrum. 68, 2538 (1997); doi: 10.1063/1.1148156.    &nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;[&#160;<a href="javascript:void(0);" onclick="javascript: window.open('/scielo.php?script=sci_nlinks&ref=4903981&pid=S1665-6423201200040000500003&lng=','','width=640,height=500,resizable=yes,scrollbars=1,menubar=yes,');">Links</a>&#160;]<!-- end-ref --></font></p>              <!-- ref --><p align="justify"><font face="verdana" size="2">&#91;4&#93; M&aacute;rquez&#45;Herrera A., Hern&aacute;ndez&#45;Rodr&iacute;guez E., Cruz&#45;J&aacute;uregui, M. P., Zapata&#45;Torres, M. y Zapata&#45;Navarro, A. Calentador de sustratos compacto y de bajo costo para tratamiento t&eacute;rmico in situ de pel&iacute;culas delgadas depositadas por rf&#45;sputtering, Rev. Mex. Fis. 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Resistive substrate heater for film processing by spray pir&oacute;lisis, Rev. Sci. Instrum. 75 (9), (2004) pp. 2884&#45;2886.    &nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;[&#160;<a href="javascript:void(0);" onclick="javascript: window.open('/scielo.php?script=sci_nlinks&ref=4903987&pid=S1665-6423201200040000500006&lng=','','width=640,height=500,resizable=yes,scrollbars=1,menubar=yes,');">Links</a>&#160;]<!-- end-ref --></font></p>              <!-- ref --><p align="justify"><font face="verdana" size="2">&#91;7&#93; Macor is a registered trademark of Corning Inc. Corning, N. 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