<?xml version="1.0" encoding="ISO-8859-1"?><article xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance">
<front>
<journal-meta>
<journal-id>1665-3521</journal-id>
<journal-title><![CDATA[Superficies y vacío]]></journal-title>
<abbrev-journal-title><![CDATA[Superf. vacío]]></abbrev-journal-title>
<issn>1665-3521</issn>
<publisher>
<publisher-name><![CDATA[Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.]]></publisher-name>
</publisher>
</journal-meta>
<article-meta>
<article-id>S1665-35212011000100002</article-id>
<title-group>
<article-title xml:lang="es"><![CDATA[Estudio del mecanismo de transporte en películas de silicio poroso]]></article-title>
</title-group>
<contrib-group>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Vásquez-A]]></surname>
<given-names><![CDATA[M. A.]]></given-names>
</name>
<xref ref-type="aff" rid="A01"/>
</contrib>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Romero-Paredes]]></surname>
<given-names><![CDATA[G.]]></given-names>
</name>
<xref ref-type="aff" rid="A01"/>
</contrib>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Peña-Sierra]]></surname>
<given-names><![CDATA[R]]></given-names>
</name>
<xref ref-type="aff" rid="A01"/>
</contrib>
</contrib-group>
<aff id="A01">
<institution><![CDATA[,Instituto Poltécnico Nacional Centro de Investigación y de Estudios Avanzados Sección de Electrónica del Estado Sólido]]></institution>
<addr-line><![CDATA[México D. F.]]></addr-line>
<country>07000</country>
</aff>
<pub-date pub-type="pub">
<day>00</day>
<month>03</month>
<year>2011</year>
</pub-date>
<pub-date pub-type="epub">
<day>00</day>
<month>03</month>
<year>2011</year>
</pub-date>
<volume>24</volume>
<numero>1</numero>
<fpage>5</fpage>
<lpage>8</lpage>
<copyright-statement/>
<copyright-year/>
<self-uri xlink:href="http://www.scielo.org.mx/scielo.php?script=sci_arttext&amp;pid=S1665-35212011000100002&amp;lng=en&amp;nrm=iso"></self-uri><self-uri xlink:href="http://www.scielo.org.mx/scielo.php?script=sci_abstract&amp;pid=S1665-35212011000100002&amp;lng=en&amp;nrm=iso"></self-uri><self-uri xlink:href="http://www.scielo.org.mx/scielo.php?script=sci_pdf&amp;pid=S1665-35212011000100002&amp;lng=en&amp;nrm=iso"></self-uri><abstract abstract-type="short" xml:lang="es"><p><![CDATA[Se identificaron los mecanismos de transporte en películas-de-silicio-poroso (PSiP) por mediciones de Corriente-Voltaje. Las PSiP se hicieron por anodización de obleas de silicio cristalino tipo p, con orientación (100) y resistividad de 1-5 &#937;cm. La resistividad eléctrica medida en las PSiP fue de 4.48 x 10(9) &#937;-cm. El transporte de carga en la PSiP está limitado por regiones de carga espacial (SCL), debido a la carga atrapada en los diversos estados de defecto. Se encontró que de acuerdo al modo de polarización y a la magnitud del potencial aplicado a la estructura planar, se induce la participación de centros de defecto profundos ocasionando que la densidad de trampas Nt, cambie.]]></p></abstract>
<abstract abstract-type="short" xml:lang="en"><p><![CDATA[The transport mechanisms in Porous Silicon Layer (PSL) were identified by Current-Voltage (I-V) measurements. The PSL was made by anodic etching of p-type crystalline (100) Si wafers and resistivity of 1-5 &#937;-cm. The electrical resistivity measured of the PSL was of 4.48 x 10(9) &#937;-cm. The carrier transport in the PSL is space charge limited (SCL) due to the trapped charge in the different defect states. Furthermore, it was found that in accordance with the bias mode and the magnitude of the applied bias to the structure, the change in the charge state of the deep defect centers cause changes in the trap density, Nt.]]></p></abstract>
<kwd-group>
<kwd lng="es"><![CDATA[Películas de silicio poroso (PSiP)]]></kwd>
<kwd lng="es"><![CDATA[Características eléctricas]]></kwd>
<kwd lng="es"><![CDATA[Mecanismo de transporte SCL]]></kwd>
<kwd lng="en"><![CDATA[Porous silicon layers]]></kwd>
<kwd lng="en"><![CDATA[Electrical characteristics]]></kwd>
<kwd lng="en"><![CDATA[Space charge limited regime]]></kwd>
<kwd lng="en"><![CDATA[Current transport mechanisms]]></kwd>
</kwd-group>
</article-meta>
</front><body><![CDATA[  	    <p align="center"><font face="verdana" size="4"><b>Estudio del mecanismo de transporte en pel&iacute;culas de silicio poroso</b></font></p>  	    <p align="center"><font face="verdana" size="2">&nbsp;</font></p>  	    <p align="center"><font face="verdana" size="2"><b>M. A. V&aacute;squez&#45;A<sup>*</sup>, G. Romero&#45;Paredes y R. Pe&ntilde;a&#45;Sierra</b></font></p>  	    <p align="center"><font face="verdana" size="2">&nbsp;</font></p>  	    <p align="justify"><font face="verdana" size="2"><i>Departamento de Ingenier&iacute;a El&eacute;ctrica, SEES del CINVESTAV&#45;IP</i><i>N</i> <i>Apartado Postal 14&#45;740, 07000 M&eacute;xico D. F.</i><sup>*</sup><a href="mailto:mava_vasquez@yahoo.com">mava_vasquez@yahoo.com</a></font></p>  	    <p align="justify"><font face="verdana" size="2">&nbsp;</font></p>  	    <p align="justify"><font face="verdana" size="2">Recibido: 27 de septiembre de 2010;    <br> 	Aceptado: 18 de enero de 2011</font></p>  	    <p align="justify"><font face="verdana" size="2">&nbsp;</font></p>  	    ]]></body>
<body><![CDATA[<p align="justify"><font face="verdana" size="2"><b>Resumen</b></font></p>  	    <p align="justify"><font face="verdana" size="2">Se identificaron los mecanismos de transporte en pel&iacute;culas&#45;de&#45;silicio&#45;poroso (PSiP) por mediciones de Corriente&#45;Voltaje. Las PSiP se hicieron por anodizaci&oacute;n de obleas de silicio cristalino tipo p, con orientaci&oacute;n (100) y resistividad de 1&#45;5 &#937;cm. La resistividad el&eacute;ctrica medida en las PSiP fue de 4.48 x 10<sup>9</sup> &#937;&#45;cm. El transporte de carga en la PSiP est&aacute; limitado por regiones de carga espacial (SCL), debido a la carga atrapada en los diversos estados de defecto. Se encontr&oacute; que de acuerdo al modo de polarizaci&oacute;n y a la magnitud del potencial aplicado a la estructura planar, se induce la participaci&oacute;n de centros de defecto profundos ocasionando que la densidad de trampas N<sub>t</sub>, cambie.</font></p>  	    <p align="justify"><font face="verdana" size="2"><b>Palabras clave:</b> Pel&iacute;culas de silicio poroso (PSiP); Caracter&iacute;sticas el&eacute;ctricas; Mecanismo de transporte SCL.</font></p>  	    <p align="justify"><font face="verdana" size="2">&nbsp;</font></p>  	    <p align="justify"><font face="verdana" size="2"><b>Abstract</b></font></p>  	    <p align="justify"><font face="verdana" size="2">The transport mechanisms in Porous Silicon Layer (PSL) were identified by Current&#45;Voltage (I&#45;V) measurements. The PSL was made by anodic etching of p&#45;type crystalline (100) Si wafers and resistivity of 1&#45;5 &#937;&#45;cm. The electrical resistivity measured of the PSL was of 4.48 x 10<sup>9</sup> &#937;&#45;cm. The carrier transport in the PSL is space charge limited (SCL) due to the trapped charge in the different defect states. Furthermore, it was found that in accordance with the bias mode and the magnitude of the applied bias to the structure, the change in the charge state of the deep defect centers cause changes in the trap density, N<sub>t</sub>.</font></p>  	    <p align="justify"><font face="verdana" size="2"><b>Keywords:</b> Porous silicon layers; Electrical characteristics; Space charge limited regime; Current transport mechanisms.</font></p>  	    <p align="justify"><font face="verdana" size="2">&nbsp;</font></p>  	    <p align="justify"><font face="verdana" size="2"><a href="/pdf/sv/v24n1/v24n1a2.pdf" target="_blank">DESCARGAR ART&Iacute;CULO EN FORMATO PDF</a></font></p>  	    <p align="justify"><font face="verdana" size="2">&nbsp;</font></p>  	    ]]></body>
<body><![CDATA[<p align="justify"><font face="verdana" size="2"><b>Agradecimientos</b></font></p>  	    <p align="justify"><font face="verdana" size="2">Este trabajo fue apoyado parcialmente por el CONACYT con el proyecto 49860. Los autores desean agradecer al M. C. Miguel Galv&aacute;n Arellano por el amplio apoyo t&eacute;cnico en las mediciones el&eacute;ctricas realizadas.</font></p>  	    <p align="justify"><font face="verdana" size="2">&nbsp;</font></p>  	    <p align="justify"><font face="verdana" size="2"><b>Referencias</b></font></p>  	    <!-- ref --><p align="justify"><font face="verdana" size="2">&#91;1&#93;. L. T. Canham, Appl. Phys. Lett., <b>57</b>, 1046 (1990).    &nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;[&#160;<a href="javascript:void(0);" onclick="javascript: window.open('/scielo.php?script=sci_nlinks&ref=9750611&pid=S1665-3521201100010000200001&lng=','','width=640,height=500,resizable=yes,scrollbars=1,menubar=yes,');">Links</a>&#160;]<!-- end-ref --></font></p>  	    <!-- ref --><p align="justify"><font face="verdana" size="2">&#91;2&#93;. Thin Solid Films, 255, "Porous Silicon", edited by Z. Chuan and R. Tsu, World Scientific, Singapore, (1995).    &nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;[&#160;<a href="javascript:void(0);" onclick="javascript: window.open('/scielo.php?script=sci_nlinks&ref=9750613&pid=S1665-3521201100010000200002&lng=','','width=640,height=500,resizable=yes,scrollbars=1,menubar=yes,');">Links</a>&#160;]<!-- end-ref --></font></p>  	    <!-- ref --><p align="justify"><font face="verdana" size="2">&#91;3&#93;. Dimova&#45;Malinovska D, Tzolov M, Tzenov N, Nesheva D., Thin Solid Films; <b>297</b>, 285 (1997).    &nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;[&#160;<a href="javascript:void(0);" onclick="javascript: window.open('/scielo.php?script=sci_nlinks&ref=9750615&pid=S1665-3521201100010000200003&lng=','','width=640,height=500,resizable=yes,scrollbars=1,menubar=yes,');">Links</a>&#160;]<!-- end-ref --></font></p>  	    ]]></body>
<body><![CDATA[<!-- ref --><p align="justify"><font face="verdana" size="2">&#91;4&#93;. Ben&#45;Chorin M., Moller F, Koch F., J. Appl. Phys. <b>77</b>, 4482 (1995).    &nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;[&#160;<a href="javascript:void(0);" onclick="javascript: window.open('/scielo.php?script=sci_nlinks&ref=9750617&pid=S1665-3521201100010000200004&lng=','','width=640,height=500,resizable=yes,scrollbars=1,menubar=yes,');">Links</a>&#160;]<!-- end-ref --></font></p>  	    <!-- ref --><p align="justify"><font face="verdana" size="2">&#91;5&#93;. Dimitrov DB, Phys. Rev. B <b>51</b>, 1562 (1995).    &nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;[&#160;<a href="javascript:void(0);" onclick="javascript: window.open('/scielo.php?script=sci_nlinks&ref=9750619&pid=S1665-3521201100010000200005&lng=','','width=640,height=500,resizable=yes,scrollbars=1,menubar=yes,');">Links</a>&#160;]<!-- end-ref --></font></p>  	    <!-- ref --><p align="justify"><font face="verdana" size="2">&#91;6&#93;. Paul Maruska H, Namavar F, Kalkhoran NK. Appl. Phys. Lett. <b>81</b>, 1338 (1992).    &nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;[&#160;<a href="javascript:void(0);" onclick="javascript: window.open('/scielo.php?script=sci_nlinks&ref=9750621&pid=S1665-3521201100010000200006&lng=','','width=640,height=500,resizable=yes,scrollbars=1,menubar=yes,');">Links</a>&#160;]<!-- end-ref --></font></p>  	    <!-- ref --><p align="justify"><font face="verdana" size="2">&#91;7&#93;. Marco Antonio V&aacute;squez Agust&iacute;n, "Realizaci&oacute;n y caracterizaci&oacute;n de estructuras de ZnO/PSiP para diodos electroluminiscentes", Tesis de Maestr&iacute;a, CINVESTAV&#45;IPN, Depto. Ingenier&iacute;a El&eacute;ctrica, 2007.    &nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;[&#160;<a href="javascript:void(0);" onclick="javascript: window.open('/scielo.php?script=sci_nlinks&ref=9750623&pid=S1665-3521201100010000200007&lng=','','width=640,height=500,resizable=yes,scrollbars=1,menubar=yes,');">Links</a>&#160;]<!-- end-ref --></font></p>  	    <!-- ref --><p align="justify"><font face="verdana" size="2">&#91;8&#93;. Murria A. Lampert, Meter Mark, Current Injection in Solids, New York and London: Academia Press, 1970.    &nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;[&#160;<a href="javascript:void(0);" onclick="javascript: window.open('/scielo.php?script=sci_nlinks&ref=9750625&pid=S1665-3521201100010000200008&lng=','','width=640,height=500,resizable=yes,scrollbars=1,menubar=yes,');">Links</a>&#160;]<!-- end-ref --></font></p>  	    ]]></body>
<body><![CDATA[<!-- ref --><p align="justify"><font face="verdana" size="2">&#91;9&#93;. Takahiro M., Hidenori m., Nobuyoshi K., Yasuaki M., J. Appl. Phys. <b>84</b>, 6157 (1998).    &nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;[&#160;<a href="javascript:void(0);" onclick="javascript: window.open('/scielo.php?script=sci_nlinks&ref=9750627&pid=S1665-3521201100010000200009&lng=','','width=640,height=500,resizable=yes,scrollbars=1,menubar=yes,');">Links</a>&#160;]<!-- end-ref --></font></p>  	    <!-- ref --><p align="justify"><font face="verdana" size="2">&#91;10&#93;. C. Peng, K. D. Hirschman, and P. M. Fauchet, J. Appl. Phys. <b>80</b>, 295 (1996).    &nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;[&#160;<a href="javascript:void(0);" onclick="javascript: window.open('/scielo.php?script=sci_nlinks&ref=9750629&pid=S1665-3521201100010000200010&lng=','','width=640,height=500,resizable=yes,scrollbars=1,menubar=yes,');">Links</a>&#160;]<!-- end-ref --></font></p>  	    <!-- ref --><p align="justify"><font face="verdana" size="2">&#91;11&#93;. Peter Mark and Wolfgang Helfrich, J. Appl. Phys, <b>33</b>, 205 (1962).    &nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;[&#160;<a href="javascript:void(0);" onclick="javascript: window.open('/scielo.php?script=sci_nlinks&ref=9750631&pid=S1665-3521201100010000200011&lng=','','width=640,height=500,resizable=yes,scrollbars=1,menubar=yes,');">Links</a>&#160;]<!-- end-ref --></font></p>  	    <!-- ref --><p align="justify"><font face="verdana" size="2">&#91;12&#93;. D. G. Yarkin, L. A. Balagurov, S. C. Bayliss and I. P. Zvyagin, Semicond. Sci. Technol. <b>19</b>, 100 (2004).    &nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;[&#160;<a href="javascript:void(0);" onclick="javascript: window.open('/scielo.php?script=sci_nlinks&ref=9750633&pid=S1665-3521201100010000200012&lng=','','width=640,height=500,resizable=yes,scrollbars=1,menubar=yes,');">Links</a>&#160;]<!-- end-ref --></font></p>  	    <p align="justify"><font face="verdana" size="2">&nbsp;</font></p>  	    <p align="justify"><font face="verdana" size="2"><b>Nota</b></font></p>  	    ]]></body>
<body><![CDATA[<p align="justify"><font face="verdana" size="2">The Editors thank to the Physics Department of the Centro de Investigaci&oacute;n y de Estudios Avanzados del IPN for the support in the publication of this issue, and the cooperation of M en C. Alejandra Garc&iacute;a Sotelo and Eng. Erasmo G&oacute;mez.</font></p>      ]]></body><back>
<ref-list>
<ref id="B1">
<label>1</label><nlm-citation citation-type="journal">
<person-group person-group-type="author">
<name>
<surname><![CDATA[Canham]]></surname>
<given-names><![CDATA[L. T.]]></given-names>
</name>
</person-group>
<source><![CDATA[Appl. Phys. Lett.]]></source>
<year>1990</year>
<volume>57</volume>
<page-range>1046</page-range></nlm-citation>
</ref>
<ref id="B2">
<label>2</label><nlm-citation citation-type="book">
<person-group person-group-type="author">
<name>
<surname><![CDATA[Chuan]]></surname>
<given-names><![CDATA[Z.]]></given-names>
</name>
<name>
<surname><![CDATA[Tsu]]></surname>
<given-names><![CDATA[R.]]></given-names>
</name>
</person-group>
<collab>Thin Solid Films</collab>
<source><![CDATA[Porous Silicon]]></source>
<year>1995</year>
<volume>255</volume>
<publisher-loc><![CDATA[Singapore ]]></publisher-loc>
<publisher-name><![CDATA[World Scientific]]></publisher-name>
</nlm-citation>
</ref>
<ref id="B3">
<label>3</label><nlm-citation citation-type="journal">
<person-group person-group-type="author">
<name>
<surname><![CDATA[Dimova-Malinovska]]></surname>
<given-names><![CDATA[D]]></given-names>
</name>
<name>
<surname><![CDATA[Tzolov]]></surname>
<given-names><![CDATA[M]]></given-names>
</name>
<name>
<surname><![CDATA[Tzenov]]></surname>
<given-names><![CDATA[N]]></given-names>
</name>
<name>
<surname><![CDATA[Nesheva]]></surname>
<given-names><![CDATA[D]]></given-names>
</name>
</person-group>
<source><![CDATA[Thin Solid Films]]></source>
<year>1997</year>
<volume>297</volume>
<page-range>285</page-range></nlm-citation>
</ref>
<ref id="B4">
<label>4</label><nlm-citation citation-type="journal">
<person-group person-group-type="author">
<name>
<surname><![CDATA[Ben-Chorin]]></surname>
<given-names><![CDATA[M.]]></given-names>
</name>
<name>
<surname><![CDATA[Moller]]></surname>
<given-names><![CDATA[F]]></given-names>
</name>
<name>
<surname><![CDATA[Koch]]></surname>
<given-names><![CDATA[F]]></given-names>
</name>
</person-group>
<source><![CDATA[J. Appl. Phys.]]></source>
<year>1995</year>
<volume>77</volume>
<page-range>4482</page-range></nlm-citation>
</ref>
<ref id="B5">
<label>5</label><nlm-citation citation-type="journal">
<person-group person-group-type="author">
<name>
<surname><![CDATA[Dimitrov]]></surname>
<given-names><![CDATA[DB]]></given-names>
</name>
</person-group>
<source><![CDATA[Phys. Rev. B]]></source>
<year>1995</year>
<volume>51</volume>
<page-range>1562</page-range></nlm-citation>
</ref>
<ref id="B6">
<label>6</label><nlm-citation citation-type="journal">
<person-group person-group-type="author">
<name>
<surname><![CDATA[Maruska H]]></surname>
<given-names><![CDATA[Paul]]></given-names>
</name>
<name>
<surname><![CDATA[Namavar]]></surname>
<given-names><![CDATA[F]]></given-names>
</name>
<name>
<surname><![CDATA[Kalkhoran]]></surname>
<given-names><![CDATA[NK]]></given-names>
</name>
</person-group>
<source><![CDATA[Appl. Phys. Lett.]]></source>
<year>1992</year>
<volume>81</volume>
<page-range>1338</page-range></nlm-citation>
</ref>
<ref id="B7">
<label>7</label><nlm-citation citation-type="">
<person-group person-group-type="author">
<name>
<surname><![CDATA[Vásquez Agustín]]></surname>
<given-names><![CDATA[Marco Antonio]]></given-names>
</name>
</person-group>
<source><![CDATA[Realización y caracterización de estructuras de ZnO/PSiP para diodos electroluminiscentes]]></source>
<year></year>
</nlm-citation>
</ref>
<ref id="B8">
<label>8</label><nlm-citation citation-type="book">
<person-group person-group-type="author">
<name>
<surname><![CDATA[Lampert]]></surname>
<given-names><![CDATA[Murria A.]]></given-names>
</name>
<name>
<surname><![CDATA[Mark]]></surname>
<given-names><![CDATA[Meter]]></given-names>
</name>
</person-group>
<source><![CDATA[Current Injection in Solids]]></source>
<year>1970</year>
<publisher-loc><![CDATA[New YorkLondon ]]></publisher-loc>
<publisher-name><![CDATA[Academia Press]]></publisher-name>
</nlm-citation>
</ref>
<ref id="B9">
<label>9</label><nlm-citation citation-type="journal">
<person-group person-group-type="author">
<name>
<surname><![CDATA[Takahiro]]></surname>
<given-names><![CDATA[M.]]></given-names>
</name>
<name>
<surname><![CDATA[Hidenori]]></surname>
<given-names><![CDATA[m.]]></given-names>
</name>
<name>
<surname><![CDATA[Nobuyoshi]]></surname>
<given-names><![CDATA[K.]]></given-names>
</name>
<name>
<surname><![CDATA[Yasuaki]]></surname>
<given-names><![CDATA[M.]]></given-names>
</name>
</person-group>
<source><![CDATA[J. Appl. Phys.]]></source>
<year>1998</year>
<volume>84</volume>
<page-range>6157</page-range></nlm-citation>
</ref>
<ref id="B10">
<label>10</label><nlm-citation citation-type="journal">
<person-group person-group-type="author">
<name>
<surname><![CDATA[Peng]]></surname>
<given-names><![CDATA[C.]]></given-names>
</name>
<name>
<surname><![CDATA[Hirschman]]></surname>
<given-names><![CDATA[K. D.]]></given-names>
</name>
<name>
<surname><![CDATA[Fauchet]]></surname>
<given-names><![CDATA[P. M.]]></given-names>
</name>
</person-group>
<source><![CDATA[J. Appl. Phys.]]></source>
<year>1996</year>
<volume>80</volume>
<page-range>295</page-range></nlm-citation>
</ref>
<ref id="B11">
<label>11</label><nlm-citation citation-type="journal">
<person-group person-group-type="author">
<name>
<surname><![CDATA[Mark]]></surname>
<given-names><![CDATA[Peter]]></given-names>
</name>
<name>
<surname><![CDATA[Helfrich]]></surname>
<given-names><![CDATA[Wolfgang]]></given-names>
</name>
</person-group>
<source><![CDATA[J. Appl. Phys]]></source>
<year>1962</year>
<volume>33</volume>
<page-range>205</page-range></nlm-citation>
</ref>
<ref id="B12">
<label>12</label><nlm-citation citation-type="journal">
<person-group person-group-type="author">
<name>
<surname><![CDATA[Yarkin]]></surname>
<given-names><![CDATA[D. G.]]></given-names>
</name>
<name>
<surname><![CDATA[Balagurov]]></surname>
<given-names><![CDATA[L. A.]]></given-names>
</name>
<name>
<surname><![CDATA[Bayliss]]></surname>
<given-names><![CDATA[S. C.]]></given-names>
</name>
<name>
<surname><![CDATA[Zvyagin]]></surname>
<given-names><![CDATA[I. P.]]></given-names>
</name>
</person-group>
<source><![CDATA[Semicond. Sci. Technol.]]></source>
<year>2004</year>
<volume>19</volume>
<page-range>100</page-range></nlm-citation>
</ref>
</ref-list>
</back>
</article>
