Bismuth coatings deposited by the pulsed dc sputtering technique

M.F. Ortiz^a,b J.J. Olaya^a,b, and J.E. Alfonso*^b

^a Departamento de Ingeniería Mecánica y Mecatrónica, Universidad Nacional de Colombia.

^b Grupo de Ciencia de Materiales y Superficies, Departamento de Física, Universidad Nacional de Colombia, *Tel: +57-1-3165000 ext. 13040 e-mail: jealfonsoo@unal.edu.co.

Abstract

In this work we present the results obtained from the deposition of nano-structured bismuth coatings through DC pulsed unbalanced magnetron sputtering. The coatings were grown on two substrates: silicon and AISI steel 316 L. The microstructure of the Bi coatings grown on silicon and the corrosion resistance of the Bi coatings grown on AISI steel were evaluated. The microstructure was evaluated by X-ray diffraction (XRD) and the corrosion resistance was characterized by means of polarization potentiodynamic and electrochemical impedance spectroscopy. Finally the morphology ofthe coatings was evaluated through scanning electronic microscopy (SEM). The XRD analysis indicates that the coatings are polycrystalline; the corrosion resistance tests indicate that the films with better corrosion resistance were deposited at 40 kHz. SEM micrographs show that the coatings are grown as granular form.

Keywords: Pulsed unbalanced magnetron sputtering; bismuth coatings; corrosion.

PACS: 81.15.Cd; 61.10.Nz; 68.37.-d; 81.65.Kn

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Acknowledgements

This research was carried out with financial support from Bis-nano and the Direction the Investigation of Universidad Nacional de Colombia, sede Bogotá (DIB) through project No 203010016843.

References

1. M. O. Boffoué, B. Lenoir, H. Scherrer, and A. Dauscher, Thin Solid Films 322 (1998) 132-137.         [ Links ]

2. H. Hattab, et al., Thin Solid Films 516 (2008) 8227-8231.         [ Links ]

3. J. Chang, H. Kim, J. Han, M. H. Jeon, and W. Y. Lee, J Appl Phys 98 (2005) 023906.         [ Links ]

4. P. M. Vereecken, L. Sun, P. C. Searson, M. Tanase, D. H. Reich, and C. L. Chien, J Appl Phys 88 (2000) 6529-6535.         [ Links ]

5. H. Ph, Progress in Surface Science 81 (2006) 191-245.         [ Links ]

6. H. Mönig, et al., Phys. RevB72 (2005) 085410.         [ Links ]

7. C. R. Ast, and H. Hochst, Phys. Rev Letters 87 (2001) 177602.         [ Links ]

8. T. Hirahara, T. Nagao, I. Matsuda, G. Bihlmayer, E. V. Chulkov, Y. M. Koroteev, and S. Hasegawa, Phys. Rev B 75 (2007) 035422.         [ Links ]

9. D. H. Kim, S. H. Lee, J. K. Kim, and G. H. Lee, Appl. Surf. Sci 252 (2006), 3225-3531.         [ Links ]

10. J. H. Mangez, J. P. Issi, and J. Heremans, Phys. RevB 14 (1976) 4381-4385.         [ Links ]

11. E. A. Hutton, B. Ogorevc, S. B. Hoeevar, F. Weldon, M. R. Smyth, and J. Wang, Electrochem. Commun. 3 (2001) 707-711.         [ Links ]

12. R., Pauliukaite, S. B. Hoeevar, B. Ogorevc, and J. Wang, Electroanalysis 16 (2004) 719-723.         [ Links ]

13. A. Jacquot, M. O. Boffoué, B. Lenoir, and A. Dauscher, Appl. Surf. Sci 156 (2000) 169-176.         [ Links ]

14. J. H. Hsu, H. X. Wang, and P. C. Kuo, J. Mag. Magn. Mater. 294 (2005) e99-e103.         [ Links ]

15. L. Kumari, S.J. Lin, J.H. Lin, Y.R. Ma, P.C. Lee, and Y. Liou, Appl. Surf. Sci253 (2007) 5931-5938.         [ Links ]

16. A. Dauscher, M. O. Boffoué, B. Lenoir, R. Martin-Lopez, and H. Scherrer, Appl. Surf. Sci 138-139 (1999) 188-194.         [ Links ]

17. C. A. Jeffrey, S. H. Zheng, E. Bohannan, D. A. Harrington, and S. Morin, Surf. Sci. 600 (2006) 95-105.         [ Links ]

18. S. Mammeri, S. Ouichaoui, H. Ammi, and R. Zemih, Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 268 (2010) 140-148.         [ Links ]

19. R. D. Arnell, P. J. Kelly, and J. W. Bradley, Surf Coat Technol 188-189 158-163.         [ Links ]

20. P. J. Kelly, and R. D. Arnell, J Vac Sci Technol 17 (1999) 945-953.         [ Links ]

21. J. W. Bradley, H. Backer, P. J. Kelly, and R. D. Arnell, Surf Coat Technol 135 (2001) 221-228.         [ Links ]

22. S. Schiller, K. Goedicke, J. Reschke, V. Kirchhoff, S. Schneider, and F. Milde, Pulsed magnetron sputter technology Surf Coat Technol 61 (1993) 331-337.         [ Links ]

23. J. Lin, J. J. Moore, B. Mishra, W. D. Sproul, and J. A. Rees, Surf Coat Technol 201 (2007) 4640-4652.         [ Links ]

24. A. Belkind, A. Freilich, J. Lopez, Z. Zhao, W. Zhu, and K. Becker, New Journal of Physics 7 (2005) 90-90.         [ Links ]

25. S. Karthikeyan, A. E. Hill, J. S. Cowpe, and R. D. Pilkington, Vacuum 85 (2010) 634-638.         [ Links ]

26. M. J. Jung, Y. M. Jung, L. R. Shaginyan, and J. G. Han, Thin Solid Films 420-421 (2002) 429-432.         [ Links ]

27. H. Bartzsch, P. Frach, and K. Goedicke, Surf Coat Technol 132 (2000) 244-250.         [ Links ]

28. C. Kokkinos A. Economou, I. Raptis, C. E. Efstathiou, and T. N. Speliotis, Electrochem. Commun. 9 (2007) 2795-2800.         [ Links ]

29. C. Kokkinos, and A. Economou, Talanta 84 (2011) 696-701.         [ Links ]

30. J. O. A. M. U. Piratoba, Revista Dyna. 164 (2009).         [ Links ]