<?xml version="1.0" encoding="ISO-8859-1"?><article xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance">
<front>
<journal-meta>
<journal-id>0035-001X</journal-id>
<journal-title><![CDATA[Revista mexicana de física]]></journal-title>
<abbrev-journal-title><![CDATA[Rev. mex. fis.]]></abbrev-journal-title>
<issn>0035-001X</issn>
<publisher>
<publisher-name><![CDATA[Sociedad Mexicana de Física]]></publisher-name>
</publisher>
</journal-meta>
<article-meta>
<article-id>S0035-001X2008000600003</article-id>
<title-group>
<article-title xml:lang="en"><![CDATA[MBE-growth and characterization of In xGa1-xAs/GaAs (x=0.15) superlattice]]></article-title>
</title-group>
<contrib-group>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Sarikavak]]></surname>
<given-names><![CDATA[B]]></given-names>
</name>
<xref ref-type="aff" rid="A02"/>
</contrib>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Öztürk]]></surname>
<given-names><![CDATA[M.K]]></given-names>
</name>
<xref ref-type="aff" rid="A03"/>
</contrib>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Altuntas]]></surname>
<given-names><![CDATA[H]]></given-names>
</name>
<xref ref-type="aff" rid="A01"/>
</contrib>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Mammedov]]></surname>
<given-names><![CDATA[T.S]]></given-names>
</name>
<xref ref-type="aff" rid="A01"/>
</contrib>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Altindal]]></surname>
<given-names><![CDATA[S]]></given-names>
</name>
<xref ref-type="aff" rid="A01"/>
</contrib>
<contrib contrib-type="author">
<name>
<surname><![CDATA[Özçelik]]></surname>
<given-names><![CDATA[S]]></given-names>
</name>
<xref ref-type="aff" rid="A01"/>
</contrib>
</contrib-group>
<aff id="A01">
<institution><![CDATA[,University of Gazi Department of Physics ]]></institution>
<addr-line><![CDATA[Ankara ]]></addr-line>
<country>Turkey</country>
</aff>
<aff id="A02">
<institution><![CDATA[,Kastamonu University Department of Physics ]]></institution>
<addr-line><![CDATA[Kastamonu ]]></addr-line>
<country>Turkey</country>
</aff>
<aff id="A03">
<institution><![CDATA[,Department of Mineral Analysis and Technology  ]]></institution>
<addr-line><![CDATA[Ankara ]]></addr-line>
<country>Turkey</country>
</aff>
<pub-date pub-type="pub">
<day>00</day>
<month>12</month>
<year>2008</year>
</pub-date>
<pub-date pub-type="epub">
<day>00</day>
<month>12</month>
<year>2008</year>
</pub-date>
<volume>54</volume>
<numero>6</numero>
<fpage>416</fpage>
<lpage>421</lpage>
<copyright-statement/>
<copyright-year/>
<self-uri xlink:href="http://www.scielo.org.mx/scielo.php?script=sci_arttext&amp;pid=S0035-001X2008000600003&amp;lng=en&amp;nrm=iso"></self-uri><self-uri xlink:href="http://www.scielo.org.mx/scielo.php?script=sci_abstract&amp;pid=S0035-001X2008000600003&amp;lng=en&amp;nrm=iso"></self-uri><self-uri xlink:href="http://www.scielo.org.mx/scielo.php?script=sci_pdf&amp;pid=S0035-001X2008000600003&amp;lng=en&amp;nrm=iso"></self-uri><abstract abstract-type="short" xml:lang="en"><p><![CDATA[A qualified In0.15Ga0.85As/GaAs superlattice was grown on an n-type GaAs(100) substrate by molecular beam epitaxy(MBE). Analysis of this structure was first carried out by X-Ray diffraction (XRD) and this structure's the interface thicknesses, roughness and x concentration determined at nanoscale. Secondly, the electrical characteristics of this sample such as the current-voltage-temperature (I-V-T), capacitance-voltage-temperature (C-V-T) and conductance-voltage temperature (G-V-T) were studied over a wide temperature range. The energy distribution of interface states was determined from the forward bias I-V characteristics by taking into account the bias dependence of the effective barrier height. Experimental results show that the forward and reverse I-V characteristics are similar to Schottky-junction behavior. The ideality factor n, series resistance Rs, barrier height &#934;B and density of interface states Nss were found to be strong functions of temperature. According to thermionic emission (TE) theory, the zero-bias barrier height (<img width=11 height=20 src="/img/revistas/rmf/v54n6/a3s1.jpg">Bo) calculated from forward bias I-V characteristics was found to increases with increasing temperature. In addition, the value of Rs as a function of both voltage and temperature was obtained from C-V and G-V characteristics. The temperature dependent of I-V, C-V and G-V characteristics confirmed that the distribution the Rs and Nss are important parameters that influence the electrical characteristics of these devices.]]></p></abstract>
<abstract abstract-type="short" xml:lang="es"><p><![CDATA[Un cualificado In0.15Ga0.85As/GaAs superenrejado ha sido desarrollado en un substrato de tipo n mediante una epitaxia de viga molecular (MBE). El análisis de esta estructura fue llevado a cabo, en primer lugar por una difracción de rayos X (XRD) y en esta estructura el grosor, la aspereza y la concentración x fueron determinadas del interfaz fueron determinados en una nano-escala. En segundo lugar, las características eléctricas de este ejemplo, tales como la actual temperatura del voltaje (I-V-T), la temperatura del voltaje capacitado (G-V-T) y la temperatura de la conductividad del voltaje (G-V-T) estudiados dentro de un amplio rango de temperaturas. La distribución energética de los estados del interfaz fue determinada de las características I-V del sesgo avanzado, teniendo en cuenta la dependencia diagonal de la altura eficaz de la barrera. Los resultados experimentales muestran como las características avanzadas e inversas I-V son similares al comportamiento de la juntura de Schottky. El factor ideal n, las resistencias en serie Rs, la altura de la barrera y la densidad de los estados del interfaz Nss resultaron ser funciones importantes de la temperatura. Segun la teoría de la emisión termoiónica (TE), la altura de la barrera del sesgo cero, calculada de las características del sesgo avanzado I-V resultaron aumentar con un aumento de la temperatura. Al mismo tiempo, el valor de R y la juntura del voltaje y la temperatura se obtuvieron de las características C-V y G-V. La temperatura dependiente de las características I-V, C-V y G-V confirmaron que la distribución de las R y N son parámetros importantes que influyen en las características eléctricas de estos mecanismos.]]></p></abstract>
<kwd-group>
<kwd lng="en"><![CDATA[MBE]]></kwd>
<kwd lng="en"><![CDATA[X-Ray diffraction]]></kwd>
<kwd lng="en"><![CDATA[series resistance]]></kwd>
<kwd lng="en"><![CDATA[interface states]]></kwd>
<kwd lng="en"><![CDATA[temperature dependent]]></kwd>
<kwd lng="es"><![CDATA[MBE]]></kwd>
<kwd lng="es"><![CDATA[difracción de rayos X]]></kwd>
<kwd lng="es"><![CDATA[serie de la resistencia]]></kwd>
<kwd lng="es"><![CDATA[interfaz fueron]]></kwd>
<kwd lng="es"><![CDATA[temperatura dependiente]]></kwd>
</kwd-group>
</article-meta>
</front><body><![CDATA[ <p align="justify"><font face="verdana" size="4">Investigaci&oacute;n</font></p>     <p align="justify"><font face="verdana" size="2">&nbsp;</font></p>     <p align="center"><font face="verdana" size="4"><b>MBE&#150;growth and characterization of In<sub>x</sub>Ga<sub>1&#150;x</sub>As/GaAs (x=0.15) superlattice</b></font></p>     <p align="justify"><font face="verdana" size="2">&nbsp;</font></p>     <p align="center"><font face="verdana" size="2"><b>B. Sarikavak<sup>a,b</sup>, M.K. &Ouml;zt&uuml;rk<sup>a,c</sup>, H. Altuntas<b><sup>&ordf;</sup></b>, T.S. Mammedov&ordf;, S. Altindal&ordf;, and S. &Ouml;z&ccedil;elik&ordf;</b></font></p>     <p align="justify"><font face="verdana" size="2">&nbsp;</font></p>     <p align="justify"><font face="verdana" size="2"><i>&ordf; Department of Physics, University of Gazi 06500 Teknikokullar Ankara&#150;Turkey,</i></font></p>     <p align="justify"><font face="verdana" size="2"><i><sup>b</sup> Department of Physics, Kastamonu University, Kastamonu, Turkey,</i></font></p>     <p align="justify"><font face="verdana" size="2"><i><sup>c</sup> Department of Mineral Analysis and Technology, 06520 Ankara, Turkey.</i></font></p>     <p align="justify"><font face="verdana" size="2">&nbsp;</font></p>     ]]></body>
<body><![CDATA[<p align="justify"><font face="verdana" size="2">Recibido el 22 de abril de 2008    <br> Aceptado el 4 de noviembre de 2008</font></p>     <p align="justify"><font face="verdana" size="2">&nbsp;</font></p>     <p align="justify"><font face="verdana" size="2"><b>Abstract</b></font></p>     <p align="justify"><font face="verdana" size="2">A qualified In<sub>0.15</sub>Ga<sub>0.85</sub>As/GaAs superlattice was grown on an n&#150;type GaAs(100) substrate by molecular beam epitaxy(MBE). Analysis of this structure was first carried out by X&#150;Ray diffraction (XRD) and this structure's the interface thicknesses, roughness and x concentration determined at nanoscale. Secondly, the electrical characteristics of this sample such as the current&#150;voltage&#150;temperature (I&#150;V&#150;T), capacitance&#150;voltage&#150;temperature (C&#150;V&#150;T) and conductance&#150;voltage temperature (G&#150;V&#150;T) were studied over a wide temperature range. The energy distribution of interface states was determined from the forward bias I&#150;V characteristics by taking into account the bias dependence of the effective barrier height. Experimental results show that the forward and reverse I&#150;V characteristics are similar to Schottky&#150;junction behavior. The ideality factor n, series resistance <i>R<sub>s</sub>, </i>barrier height <i>&Phi;</i><sub>B</sub> and density of interface states <i>N<sub>ss</sub> </i>were found to be strong functions of temperature. According to thermionic emission (TE) theory, the zero&#150;bias barrier height (<i><sub><img src="/img/revistas/rmf/v54n6/a3s1.jpg">Bo</sub></i>) calculated from forward bias I&#150;V characteristics was found to increases with increasing temperature. In addition, the value of <i>R<sub>s</sub> </i>as a function of both voltage and temperature was obtained from C&#150;V and G&#150;V characteristics. The temperature dependent of I&#150;V, C&#150;V and G&#150;V characteristics confirmed that the distribution the <i>R<sub>s</sub> </i>and <i>N<sub>ss</sub> </i>are important parameters that influence the electrical characteristics of these devices.</font></p>     <p align="justify"><font face="verdana" size="2"><b>Keywords: </b>MBE; X&#150;Ray diffraction; series resistance; interface states; temperature dependent.</font></p>     <p align="justify"><font face="verdana" size="2">&nbsp;</font></p>     <p align="justify"><font face="verdana" size="2"><b>Resumen</b></font></p>     <p align="justify"><font face="verdana" size="2">Un cualificado In<sub>0.15</sub>Ga<sub>0.85</sub>As/GaAs superenrejado ha sido desarrollado en un substrato de tipo n mediante una epitaxia de viga molecular (MBE). El an&aacute;lisis de esta estructura fue llevado a cabo, en primer lugar por una difracci&oacute;n de rayos X (XRD) y en esta estructura el grosor, la aspereza y la concentraci&oacute;n x fueron determinadas del interfaz fueron determinados en una nano&#150;escala. En segundo lugar, las caracter&iacute;sticas el&eacute;ctricas de este ejemplo, tales como la actual temperatura del voltaje (I&#150;V&#150;T), la temperatura del voltaje capacitado (G&#150;V&#150;T) y la temperatura de la conductividad del voltaje (G&#150;V&#150;T) estudiados dentro de un amplio rango de temperaturas. La distribuci&oacute;n energ&eacute;tica de los estados del interfaz fue determinada de las caracter&iacute;sticas I&#150;V del sesgo avanzado, teniendo en cuenta la dependencia diagonal de la altura eficaz de la barrera. Los resultados experimentales muestran como las caracter&iacute;sticas avanzadas e inversas I&#150;V son similares al comportamiento de la juntura de Schottky. El factor ideal n, las resistencias en serie Rs, la altura de la barrera y la densidad de los estados del interfaz Nss resultaron ser funciones importantes de la temperatura. Segun la teor&iacute;a de la emisi&oacute;n termoi&oacute;nica (TE), la altura de la barrera del sesgo cero, calculada de las caracter&iacute;sticas del sesgo avanzado I&#150;V resultaron aumentar con un aumento de la temperatura. Al mismo tiempo, el valor de R y la juntura del voltaje y la temperatura se obtuvieron de las caracter&iacute;sticas C&#150;V y G&#150;V. La temperatura dependiente de las caracter&iacute;sticas I&#150;V, C&#150;V y G&#150;V confirmaron que la distribuci&oacute;n de las R y N son par&aacute;metros importantes que influyen en las caracter&iacute;sticas el&eacute;ctricas de estos mecanismos.</font></p>     <p align="justify"><font face="verdana" size="2"><b>Descriptores: </b>MBE; difracci&oacute;n de rayos X; serie de la resistencia; interfaz fueron; temperatura dependiente. </font></p>     ]]></body>
<body><![CDATA[<p align="justify"><font face="verdana" size="2">&nbsp;</font></p>     <p align="justify"><font face="verdana" size="2">PACS: 78.66.Fd; 81.15.Hi; 78.70.Ck; 73.90.+f</font></p>     <p align="justify"><font face="verdana" size="2">&nbsp;</font></p>     <p align="justify"><font face="verdana" size="2"><a href="/pdf/rmf/v54n6/v54n6a3.pdf" target="_blank">DESCARGAR ART&Iacute;CULO EN FORMATO PDF</a></font></p>     <p align="justify"><font face="verdana" size="2">&nbsp;</font></p>     <p align="justify"><font face="verdana" size="2"><b>Acknowledgements</b></font></p>     <p align="justify"><font face="verdana" size="2">This work is supported by the DPT and the project number is 2001K120590.</font></p>     <p align="justify"><font face="verdana" size="2">&nbsp;</font></p>     <p align="justify"><font face="verdana" size="2"><b>References</b></font></p>     <!-- ref --><p align="justify"><font face="verdana" size="2">1. P.M. 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