Refractive index of multiline nanosecond laser–induced periodic surface structures and porous silicon
J.E. Alfonso–Orjuela* a,b,c, D.F. Andrade–Zambranob,d, J.M. Arroyo–0soriod
a Departamento de Física, Universidad Nacional de Colombia. *Tel: +57–1–3165000 ext. 13040 e–mail: jealfonsoo@unal.edu.co
b Grupo de materiales con Aplicaciones Tecnológicas (GMAT).
c Centro Internacional de Física (CIF), Colombia.
d Departamento de Ingeniería Mecánica y Mecatrónica, Universidad Nacional de Colombia.
]]>Recibido el 21 de junio de 2011
Aceptado el 19 de septiembre de 2011
Abstract
To study the effect of multiline laser processing in the optical response of silicon, a set of p–type single–crystalline silicon wafers with 0.01 to 0.02 Ωm resistivity, 525 μm thickness, and [111] orientation, was irradiated with a multiline Nd:YAG pulsed laser (1064, 532 and 355 nm) applying energies from 310 to 3100 J. A group of those surfaces was produced using argon gas blowing, while other group was manufactured in free atmosphere. Using confocal microscopy, it was observed that the gas–protected samples shown surface periodic structures in the form of ripples with an average pitch of 547 nm. Trough diffuse reflectance tests it was determined that proportionally to the energy supplied in the laser processing, these surfaces reflect between 10% and 30% in the UV region and between 60% and 80% in the IR region. On the other hand, the free atmosphere–made surfaces presented structures and diffraction properties characteristic of porous silicon (PS). The refractive index of the surfaces with periodic structures was calculated based on the diffuse reflectance measures while that of PS surfaces was calculated using the surface voids fraction (pores) determined with the confocal microscope image analysis software.
Keywords: Laser ablation; silicon; periodic structures; porous silicon (PS); refractive index.
Resumen
Para estudiar el efecto del tratamiento con laser multilínea en la respuesta (óptica del silicio, un conjunto de obleas de silicio tipo p monocristalino con resistividad entre 0,01 y 0,02 Ωm, espesor de 525 μm y orientación [111], fue irradiado con un láser Nd: YAG pulsado multilínea (1064, 532 y 355 nm) aplicando energías entre 310 y 3100 J. Un grupo superficies fue producido utilizando soplado con gas argón, mientras que otro grupo fue fabricado en atmósfera libre. Utilizando microscopía confocal, se observe) que las muestras protegidas con gas presentaron estructuras de superficie periódicas en forma de ondas con un paso promedio de 547 nm. A través de pruebas de reflectancia difusa, se confirma que en proporción a la energía suministrada en el tratamiento láser, estas superficies reflejan entre 10% y 30% en la región UV y entre 60% y 80% en la región IR. De otro lado, las superficies tratadas en atmósfera libre presentaron estructuras y propiedades de difracción características del silicio poroso (PS). El índice de refracción de las superficies con estructuras periódicas se calculó con base en las medidas de reflectancia difusa mientras que el de las superficies tipo PS se calculó utilizando la fracción de vacios (poros) en la superficie que a su vez se determinó con el software de análisis de imágenes del microscopio confocal.
]]> Descriptores: Ablación láser; silicio; estructuras periódicas; silicio poroso (PS); índice de refracción.
PACS: 79.20.Eb; 78.20.Ci
DESCARGAR ARTÍCULO EN FORMATO PDF
Acknowledgments
The authors gratefully acknowledge the support of the Bogota Research Division of National University of Colombia under the grants DIB–7178 andDIB–2010100–0001.
References
]]>1. Z.C. Feng and R. Tsu, (Editors), Porous Silicon, (World Scientific, Singapore, 1994). [ Links ]
2. O. Bisi, S. Ossicini, and L. Pavesi, Surface Science Reports 38 (2000) 1. [ Links ]
3. X. Zhao, O. Schoenfeld, S. Nomura, S. Komuro, Y. Aoyagi and T. Sugano, Materials Science and Engineering B. 35 (1995) 467. [ Links ]
4. A. Ramírez, L.F. Fonseca and O. Resto, Materials Research Society Symposium Proceedings 737 (2003) F3.30.1 [ Links ]
5. T.L. Rittenhouse, P.W. Bohn, T.K. Hossain, Ll. Adesida, J. Lin–desay and A. Marcus, Journal of Applied Physics. 95 (2004) 490. [ Links ]
6. R.Q. Zhang, J. Costa, E. Bertran, Physical Review B 53 (1996) 7847. [ Links ]
7. Y. Zhao, D. Yang, D. Lia, M. Jiang, Materials Science and Engineering B. 116 (2005) 95. [ Links ]
8. T. Komoda et al., Nuclear Instruments and Methods in Physics Research B. 96 (1995)387. [ Links ]
9. G. Recio, V. Torres, M. Manso, D. Gallach, J. López and R. J. Martín, Materials 3 (2010) 755. [ Links ]
10. R.D. Mansano, P.B. Verdonck and H.S. Maciel, Sensors and Actuators A. 65 (1998) 180. [ Links ]
11. P. Granitzer and K. Rumpf, Materials. 3 (2010) 943. [ Links ]
12. B.G. Rasheed, H.S. Mavi, A.K. Shukla, S.C. Abbi and K.P. Jain, Materials science and engineering B. 79 (2001) 71. [ Links ]
13. H.S. Mavi, B.G. Rasheed, A.K. Shukla, S.C. Abbi and K.P. Jain, Journal of non–crystalline solids. 286 (2001) 162. [ Links ]
14. A.V. Kabashin and M. Meunier, Materials science and engineering B. 101 (2003) 60. [ Links ]
15. T. Hua, R.R. Finlay, C. Wu and S. Deliwala, Applied Physics Letters. 73 (1998) 1673. [ Links ]
16. M. Dickey, C. Holswade and L. Shealy, Laser beam shaping applications (Taylor & Francis–CRC Press, 2006). [ Links ]
17. H. Misawa and S. Juodkazis, 3D laser microfabrication principles and applications (Wiley–Verlag, Weinheim, 2006). [ Links ]
18. V.V. Semak, B.R. Campbell and J.G. Thomas, Journal of Physics D: Applied Physics. 39 (2006) 3440. [ Links ]
19. N.B. Dahotre and S.P. Harimkar, Laser fabrication and machining of materials (Springer, 2008). [ Links ]
20. J.M. Arroyo, A.E. Diniz and M.S.F. de Lima, Surface and Coatings Technology. 204 (2010) 2410. [ Links ]
21. E. Hasman, N. Davidson, Y. Danziger and A. Friesem, Diffractive optics design, realization, and applications (Department of Physics of Complex Systems – Weizmann Institute of Science, Rehovot, Israel, 1997). [ Links ]
22. W. Lauterborn and T. Kurz, Coherent optics fundamentals and applications (Springer, 2003). [ Links ]
23. F. Ray, Applied photographic optics (Focal Press, 2002). [ Links ]
24. W. Goodman, Introduction to Fourier Optics (Roberts & Company Publishers, 2005). [ Links ]
25. S. Martellucci and A.N. Chester, Diffractive optics and optical microsystems (Plenum Press, New York, 1997). [ Links ]
26. D.C.O. Shea, T.J. Suleski, A.D. Kathman and D.W. Prather, Diffractive optics design fabrication and test (The Society of Photo–Optical Instrumentation Engineers, 2004). [ Links ]
27. R.R. Shannon, The art and science ofoptical design (Cambridge University Press, 1997). [ Links ]
28. A.E. Pap, K. Kordas, J. Vahakangas, A. Uusimaki, S. Lep–pavuori, L. Pilon and S. Szatmari, Optical Materials 28 (2006) 506. [ Links ]
29. A.P. Hakhoyan and S.V. Melkonyan, Armenian Journal of Physics 1 (2008) 146. [ Links ]
30. A.Y. Vorobyev and C. Guo, Journal of Applied Physics 103 (2008) 043513–1. [ Links ]
31. S. S. Lyer and A. J. Auberton, Silicon wafer bonding technology for VLSI and MEMS applications, (The Institution of Electrical Engineers, London, 2002). [ Links ]
32. X. Wang, G. Lim, F. Ng, W. Liu and S. Chua, Applied Surface Science 252 (2005) 1492. [ Links ]
33. M. Trtica, B. Gakovic, B. Radak, D. Batani, T. Desai and M. Bussoli, Applied Surface Science 254 (2007) 1377. [ Links ]
34. R. Hull, Properties of Crystalline Silicon (Institution of Engineering and Technology, 1999). [ Links ]
]]>