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Revista mexicana de física

versão impressa ISSN 0035-001X

Resumo

MILLS, A.  e  VALENZUELA, M.A.. Photo-oxidation of water sensitized by TiO2 and WO3 in presence of different electron acceptors. Rev. mex. fis. [online]. 2004, vol.50, n.3, pp.287-296. ISSN 0035-001X.

The photo-oxidation of water is studied in presence of UV-light (λ < 400 nm) using titanium dioxide (TiO2) and tungsten oxide (WO3,micro-and nano-crystalline) semiconductors in presence of different sacrificial electron acceptors (SEA): Fe(NO3)2, Na2S2O8, Ce(SO4)2, Co[(NH3)5Cl]Cl2, AgNO3, HgCl2 and Cu(NO3)2. TiO2 is 5 to 10 times more photoactive than WO3 with reference to oxygen evolution. Ag ions are the best of the SEAs, for all the semiconductors tested in the photo-redox process. No oxygen evolution is observed when Hg2+ or Cu2+ ions are used as SEAs. The effect of high (10-2 mol dm-3) and low (10-3 mol dm-3) SEA concentrations is also studied but no common trend is observed. Instead, each system (i.e., SEA+H2O+Semiconductor) exhibits a different behaviour and the results are rationalised in terms of the spectral and redox potential features of the system.

Palavras-chave : Semiconductor photosynthesis; TiO2; WO3; water oxidation; electron acceptor.

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