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 Chale-Lara, F. et al. Deposit of AlN thin films by nitrogen reactive pulsed laser ablation using an Al target. Rev. mex. fis., Aug 2019, vol.65, no.4, p.345-350. ISSN 0035-001X
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 Tiznado, H. et al. TiO2 and Al2O3 ultra thin nanolaminates growth by ALD; instrument automation and films characterization. Rev. mex. fis., Dec 2012, vol.58, no.6, p.459-465. ISSN 0035-001X
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