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Chale-Lara, F. et al.
Deposit of AlN thin films by nitrogen reactive pulsed laser ablation using an Al target
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Rev. mex. fis.
, Aug 2019, vol.65, no.4, p.345-350. ISSN 0035-001X
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Tiznado, H. et al.
TiO
2
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ultra thin nanolaminates growth by ALD; instrument automation and films characterization
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Rev. mex. fis.
, Dec 2012, vol.58, no.6, p.459-465. ISSN 0035-001X
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